The En Foco Artist Fellowship Program is designed to support artists of color who utilize lens-based mediums and digital media technologies in their creative processes. This program merges the previous Photography Fellowship and Media Arts Fund, creating a unified opportunity for photographers and media-based artists in New York State. While applicants may apply to both forms for photographers and media-based artists, they will receive only one award. Submissions will be evaluated by a panel of industry professionals, ensuring recognition for the highest-quality work.
En Foco is highly regarded for its leadership in support of artists of color and for its advocacy role in addressing issues related to cultural equity and access. Previous Fellows have gained access to numerous opportunities beyond the fellowship.
Artists who apply for the Fellowship may also be considered for future issues of Nueva Luz, Exhibitions, and other opportunities.